ALD/ALE 2021 is Going Virtual June 27-30, 2021 due to the Covid19 situation.
Virtual Meeting Overview & Highlights
The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be adapted into a Virtual Meeting comprised of Live and On Demand Sessions. The registration deadline is June 30, 2021; all presenters must register by May 1, 2021. The event will feature:
- Live Tutorial Session with live Q&A Chat opportunities (Sunday, June 27, 2021)
- Live Plenary, Awards, and Student Finalists with live Q&A Chat opportunities (Monday, June 28, 2021)
- Live Parallel Technical Sessions with live Q&A Chat opportunities (Tuesday-Wednesday, June 29-30, 2021)
- On Demand Oral Sessions (Starting Monday, June 28, 2021)
- On Demand Poster Sessions with a Mix of Pre-recorded (Video or Audio) Talks and/or PDF files
- Live and On Demand Sessions available on Mobile App/Online Scheduler through July 31, 2021 and then to AVS members in the AVS Technical Library
Note: Live Sessions will also be recorded and added to the On Demand Sessions.
ALD Program Chairs Program Chair: Seán Barry (Carleton University, Canada)
Program Co-Chair: Scott Clendenning (Intel, USA) |
| ALE Program Chairs
Program Chair: Jane Chang (University of California, Los Angeles, USA)
Program Co-Chair: Thorsten Lill (Lam Research, USA) |
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