ALD/ALE 2021 is Going Virtual June 27-30, 2021

ALD/ALE 2021 is Going Virtual June 27-30, 2021 due to the Covid19 situation.

Virtual Meeting Overview & Highlights

The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be adapted into a Virtual Meeting comprised of Live and On Demand Sessions. The registration deadline is June 30, 2021; all presenters must register by May 1, 2021. The event will feature:

• Live Tutorial Session with live Q&A Chat opportunities (Sunday, June 27, 2021)
• Live Plenary, Awards, and Student Finalists with live Q&A Chat opportunities (Monday, June 28, 2021)
• Live Parallel Technical Sessions with live Q&A Chat opportunities (Tuesday-Wednesday, June 29-30, 2021)
• On Demand Oral Sessions (Starting Monday, June 28, 2021)
• On Demand Poster Sessions with a Mix of Pre-recorded (Video or Audio) Talks and/or PDF files
• Live and On Demand Sessions available on Mobile App/Online Scheduler through July 31, 2021 and then to AVS members in the AVS Technical Library

AVS ALD/ALE 2021 Web

Note: Live Sessions will also be recorded and added to the On Demand Sessions.

ALD Program Chairs   Program Chair: Seán Barry (Carleton University, Canada) Program Co-Chair: Scott Clendenning (Intel, USA)

ALE Program Chairs Program Chair: Jane Chang (University of California, Los Angeles, USA) Program Co-Chair: Thorsten Lill (Lam Research, USA)