Monday, April 5, 2021

ALD/ALE 2021 is Going Virtual June 27-30, 2021

ALD/ALE 2021 is Going Virtual June 27-30, 2021 due to the Covid19 situation.

Virtual Meeting Overview & Highlights

The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be adapted into a Virtual Meeting comprised of Live and On Demand Sessions. The registration deadline is June 30, 2021; all presenters must register by May 1, 2021. The event will feature:
  • Live Tutorial Session with live Q&A Chat opportunities (Sunday, June 27, 2021)
  • Live Plenary, Awards, and Student Finalists with live Q&A Chat opportunities (Monday, June 28, 2021)
  • Live Parallel Technical Sessions with live Q&A Chat opportunities (Tuesday-Wednesday, June 29-30, 2021)
  • On Demand Oral Sessions (Starting Monday, June 28, 2021)
  • On Demand Poster Sessions with a Mix of Pre-recorded (Video or Audio) Talks and/or PDF files
  • Live and On Demand Sessions available on Mobile App/Online Scheduler through July 31, 2021 and then to AVS members in the AVS Technical Library

AVS ALD/ALE 2021 Web

Note: Live Sessions will also be recorded and added to the On Demand Sessions.




ALD Program Chairs
 
Program Chair:
Seán Barry (Carleton University, Canada)

Program Co-Chair:
Scott Clendenning (Intel, USA)
ALE Program Chairs

Program Chair:
Jane Chang (University of California, Los Angeles, USA)

Program Co-Chair:
Thorsten Lill (Lam Research, USA)

No comments:

Post a Comment