Friday, November 9, 2018

Coverage, Composition and Band Gap Analysis of ALD-Grown Ultra Thin Films

[AZO Network News E-mail] Analyzing and developing ultra-thin film materials requires multiple data points typically from multiple instruments and techniques. Find out how one surface analysis instrument provides a complete picture of an ALD-grown ultra-thin film with information on composition and thickness, surface coverage and band gap measurements.


The Thermo Scientific™ Nexsa XPS System is not only a fully automated and intuitively programmed device, but has the advantage of being able to offer multi-technique analysis as well. This has made it a still more efficient and useful machine than its predecessor, the highly successful Thermo Scientific™ K-Alpha XPS system.

The Nexsa makes coincident analysis possible because it uses multiple methods, namely, UV photoelectron spectroscopy (UPS), ion scattering spectroscopy (ISS), reflected energy loss spectroscopy (REELS) and Raman spectroscopy. Taking advantage of this capability, the Nexsa was used to investigate various properties of a set of samples of HfO2. Each sample was made up of a thin layer of HfO2 laid down using a graded number of atomic layer deposition (ALD) cycles. Initially, the mass of Hf laid down on the substrate was measured quantitatively using XPS, as well as the thickness of the layers of HfO2 and SiO2. ISS and REELS were then used to carry out further analysis to obtain surface coverage and band gap readings respectively.

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