Tuesday, December 5, 2017

Atomic Layer Processing for free!


Journal of Vacuum Science & Technology  is  More than Vacuum

Recent Atomic Layer Processing Articles 


Submit Your Articles on Atomic Layer Processing to JVST 
 
The following articles are free to download for next 30 days:

Quasi-atomic layer etching of silicon nitride
Sonam D. Sherpa and Alok Ranjan
J. Vac. Sci. Technol., A 35, 01A102 (2017) | Read More 
 
Predicting synergy in atomic layer etching
Keren J. Kanarik, Samantha Tan, Wenbing Yang, Taeseung Kim, Thorsten Lill, Alexander Kabansky, Eric A. Hudson, Tomihito Ohba, Kazuo Nojiri, Jengyi Yu, Rich Wise, Ivan L. Berry, Yang Pan, Jeffrey Marks, and Richard A. Gottscho
J. Vac. Sci. Technol., A 35, 05C302 (2017) |  Read More 
 
Atomic layer etching of SiO2 by alternating an O2 plasma with fluorocarbon film deposition
Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Masaru Zaitsu, Akiko Kobayashi, Toshihisa Nozawa, and Nobuyoshi Kobayashi
J. Vac. Sci. Technol., A 35, 01A103 (2017) | Read More 
 
Review Article: Plasma-surface interactions at the atomic scale for patterning metals
Nicholas D. Altieri, Jack Kun-Chieh Chen, Luke Minardi, and Jane P. Chang
J. Vac. Sci. Technol., A 35, 05C203 (2017) |  Read More 
 
Atomic layer etching in close-to-conventional plasma etch tools
Andy Goodyear and Mike Cooke
J. Vac. Sci. Technol., A 35, 01A105 (2017) |  Read More 
 
Correcting defects in area selective molecular layer deposition
Richard G. Closser, David S. Bergsman, Luis Ruelas, Fatemeh Sadat Minaye Hashemi, and Stacey F. Bent
J. Vac. Sci. Technol., A 35, 031509 (2017) | Read More 
 
Revisiting the growth mechanism of atomic layer deposition of Al2O3: A vibrational sum-frequency generation study
Vincent Vandalon and W. M. M. (Erwin) Kessels
J. Vac. Sci. Technol., A 35, 05C313 (2017) | Read More 
 
High-k oxides by atomic layer deposition-Applications in biology and medicine
Marek Godlewski, Sylwia Gierałtowska, Łukasz Wachnicki, Rafał Pietuszka, Bartłomiej S. Witkowski, Anna Słońska, Zdzisław Gajewski, and Michał M. Godlewski
J. Vac. Sci. Technol., A 35, 021508 (2017) |  Read More 
 
Atomic layer deposition of h-BN(0001) on RuO2(110)/Ru(0001)
Jessica Jones, Brock Beauclair, Opeyemi Olanipekun, Sherard Lightbourne, Mofei Zhang, Brittany Pollok, Aparna Pilli, and Jeffry Kelber
J. Vac. Sci. Technol., A 35, 01B139 (2017) |  Read More 
 
Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision
David R. Boris, Tzvetelina B. Petrova, George M. Petrov, and Scott G. Walton
J. Vac. Sci. Technol., A 35, 01A104 (2017) |  Read More