Friday, May 26, 2017

ALD & Synchotron Radiation at e-MRS 2017, fall meeting in Warsaw

Information from the symposium chairs Malgorzata Kot, Claudia Wiemer, Gianluca Ciatto and Joachim Schnadt: The deadline for abstract submission to e-MRS 2017, fall meeting, is approaching, please consider to submit an abstract to:

SYMPOSIUM Q: "SYNCHROTRON RADIATION AND ATOMIC LAYER DEPOSITION FOR ADVANCED MATERIALS"

Please visit the symposium website at
http://www.european-mrs.com/synchrotron-radiation-and-atomic-layer-deposition-advanced-materials-emrs

abstract submission deadline: Monday, May 29th!

Hot topics to be covered by the symposium:
  • Characterization of ALD processes and materials (metals, oxides) using synchrotron light (PES, XANES, EXAFS, GISAXS, XRD, XRR, XRF, etc.)
  • Investigation of ALD film nucleation, interface properties and growth by laboratory-based tools
  • In situ/operando monitoring of ALD processes (APXPS, infrared spectroscopy, etc.)
  • Modeling of the Atomic Layer Deposition
  • ALD method types (thermal, plasma and electron enhanced, spatial, etc.) 
  • Application of ALD (solar cells, LED, HEMT, MIM capacitors, LMR silica-fiber sensors, GaN power devices, TSV field effect transistor, MEMS, etc.)