Invited speakers:"Growth under the influence of chemistry: understanding the evolution of microstructure and the emergence of crystallinity during the early stages of growth"
Argonne National Laboratories, USA
"Aerotaxy: an efficient aerosol-based method for growth of device quality semiconductor nanowires"
Lund university, Sweden
"Topographical and area selectivity in atomic layer deposition"
Stanford University, USA
"AACVD of metal oxides: from precursor synthesis to TCOs and photocatalysts"
University College London, UK
"Nucleation mechanisms for Chemical Vapor Deposition and Atomic Layer Deposition of 2D semiconductor materials"
"Extending ALD adoption in Sub-14nm Nodes, and Beyond Semiconductors, Through Precursors Innovation"
Air Liquide, France