Thursday, April 27, 2017

E-MRS Fall Meeting 2017 - Symposium Q, Call for abstracts

Here is an opportunity fro all ALD Folks to attend and present at EMRS Fall Meeting 2017.
On behalf of the symposium organizers I would like to encourage you to submit an abstract to the Symposium Q: “Synchrotron Radiation and Atomic Layer Deposition for Advanced Materials” to be held from the 18th until 21st of September 2017 in Warsaw (Poland) during the E-MRS Fall Meeting 2017.

Abstract submission deadline:
May 29th, 2017.


The Organizers

Malgorzata Kot, Claudia Wiemer, Gianluca Ciatto and Joachim Schnadt

Confirmed invited speakers:
· Dr. J. Dendooven (Ghent University, Belgium), ALD to grow metals - Pt
· Dr. S. Elliott (Tyndall National Institute, Ireland), Simulating Atomic Layer Deposition
· Dr. D. Fong (Argonne National Laboratories, USA), Applying in-situ X-ray scattering and fluorescence to monitor the ALD growth of materials
· Prof. E. Kessels (TU Eindhoven, The Netherlands), Application of ALD in solar cells
· Prof. J. L. MacManus-Driscoll (University of Cambridge, UK), Atmospheric pressure spatial atomic layer deposition of thin films: Reactors, doping, and devices
· Prof. M. Ritala (University of Helsinki, Finland), ALD of thin films for microelectronics
· Dr. T. Schenk (Namlab, Germany), ALD for memory devices
· Dr. J. Sprenger (University of Colorado at Boulder, USA) Low temperature Electron Enhanced ALD
· Dr. M. Tallarida (ALBA, Spain), Characterization of ALD processes and materials using synchrotron

Manuscripts submitted to the Symposium Q, after peer-review process, will be published in the Synchrotron Radiation and Atomic Layer Deposition for Advanced Materials Special Issue of the Journal of Vacuum Science & Technology A.

Manuscript submission deadline: November 15th, 2017