TU Eindhoven and Philips Innovation Labs have just publishe a very intersteing paper on ALD of Al2O3 on prestine graphene inclusing various post deposition treatments to achive higher mobility. The trick to deposit uniform Al2O3 on graphene is by using reversible hydrogen plasma functionalization prior to ALD Al2O3 using a Oxford Instruments FlexAl PEALD reactor. Please check tha paper in Chemistrry of Materials below for more details.
Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma FunctionalizationRené H. J. Vervuurt, Bora Karasulu, Marcel A. Verheijen, Wilhelmus (Erwin) M. M. Kessels, and Ageeth A. Bol
Chem. Mater., 2017, 29 (5), pp 2090–2100
Uniform #aldep of Al2O3 on #graphene by reversible H plasma functionalization @TUeindhoven @PhilipsInS #Philips https://t.co/lb37KnnxgD pic.twitter.com/ksWrXMbzEw— Chem of Materials (@ChemMater) March 22, 2017