Monday, February 6, 2017

ALD2017 & ALE 2017 Joint Tutorial, Denver, USA

The joint tutorials for AVS 17th International Conference on Atomic Layer Deposition (ALD 2017) featuring the 4th International Atomic Layer Etching Workshop (ALE 2017) has been released with a great line up. As in past years, the tutorials will be taking place the day before the actual conference (Saturday, July 15).



ALD & ALE 2017 Tutorial Speakers [LINK]

David Emslie (McMaster Univ.), “ALD Precursors, Precursor Design, Chemistry and Mechanisms”

Adrie Mackus (Eindhoven Univ. of Technology), “Approaches, Challenges, and Opportunities for Area-selective ALD”

Mato Knez (Nanogune), “Coating of Physically and Chemically Challenging Substrates”

Simon Elliott (Tyndall National Institute), “What Theory Can Tell us About ALD Mechanism”

Vincent Donnelly (University of Houston), “History of Plasma Etching”

Geun Young Yeom (Sungkyunkwan Univ.), “Atomic Layer Etching with Ion/Neutral Beams