Thursday, October 19, 2017

Conductance measurements optimize atomic layer deposition automatically

As reported by nanotechweb.org: An in situ measurement technique that can monitor the process of atomic layer deposition (ALD) in real time has been developed by scientists in Germany. The researchers used changes in the conductance of layers over multiple ALD cycles to identify the different growth phases as they occurred, allowing undesired modes of deposition to be averted. The conductance signal was also used as the input to a genetic algorithm that could optimize the growth rate semi-automatically.

Wednesday, October 18, 2017

ALD FOR INDUSTRY, MARCH 21 – 22, 2018 – DRESDEN:

ALD FOR INDUSTRY, MARCH 21 – 22, 2018 – DRESDEN: Following the succes of ALD for Industry 2017 with 100 participants we will continue to organize this event. This time we have extended the Workshop with half a day to a full 2 day event and the ALD Exhhibition will also be open for the public! In addition, the part of the workshop will be a HERALD Event so please contact us for more details on that.

Conference Chairs: Jonas Sundqvist, Fraunhofer IKTS and Christoph Hossbach, Picosun Germany
Tutorial Chair: Colin Georgi, Fraunhofer ENAS

Committee: Bernd Hintze (invited speaker), Globalfoundries and Henry Bernhardt, Infineon


Background: A topical workshop with focus on industrialization and commercialization of ALD for current and emerging markets Atomic Layer Deposition (ALD) is used to deposit ultrathin and highly conformal thin films. ALD is unique in the sense that it employs sequential self-limiting surface reactions for growth in the monolayer thickness regime. 

ALD in Germany: According to market estimates the equipment market alone is currently at an annual revenue of US$ 1.5 - 1.7 billion (2017) and it is expected to double in the next 4- 5 years. In a European context ALD was invented independently twice in Europe (Russia & Finland) and since the last 15 years Germany has grown to become one of the strongest European markets for ALD in R&D, chemicals, equipment and end users. Here, Dresden and Saxony isa unique ALD hotspot due to a strong semiconductor and equipment industry.

The Event will focus on the current markets for ALD, besides the leading edge semiconductor industry, applications in MEMS and Sensors, Display, Lightning, Barriers and Photovoltaics will be addressed.

 
Sponsors (signed so far):

CONTACT:
Dr. Katrin Ferse
Europäische Forschungsgesellschaft Dünne Schichten e. V.
Gostritzer Str. 63, 01217 Dresden, Tel. +49 351 871 8374, Fax: +49 351 8718431
E-Mail: ferse@efds.org, web: www.efds.org
 
Dr. Jonas Sundqvist 

Fraunhofer IKTS, Dünnschicht-Technologien | Thin-Film Technologies, Winterbergstraße 28, 01277 Dresden, Germany
Telefon +49 351 2553 7693, Mobile +49 173 4394 239
E-Mail: jonas.sundqvist@ikts.fraunhofer.de
www.ikts.fraunhofer.de

 

CMC Conference Call for Papers - April 26-27 in Phoenix, AZ, USA

The Critical Materials Council (CMC) Conference Committee has issued a call for papers to be presented at the 2018 CMC Conference April 26-27 in Phoenix, AZ, USA. Following the annual members-only CMC meeting to be held earlier that week, the 2018 CMC Conference is open to the public. 
 


KEYNOTE: David Bloss, Vice President, Technology and Manufacturing Group Director, Lithography Technology Sourcing, Global Supply Management, Intel Corp.

Three sessions will cover the following themes:

I. Global supply-chain issues of economics and regulations,
II. Immediate challenges of materials & manufacturing, and
III. Emerging materials in R&D and pilot fabrication.

To submit a paper for consideration, please send a 1-page abstract by January 15, 2018 to cmcinfo@techcet.com.

Attendees will include industry experts handling supply-chains, business-development, R&D, and product management, as well as academics and analysts. CMC member companies will be attending this meeting, as it is an important part of their membership.

On behalf of the CMC Conference Committee,

Lita Shon-Roy, Jonas Sundqvist, Ph.D., Ed Korczynski

Monday, October 16, 2017

ALD 2018 July 29-Wednesday, August 1 Incheon, South Korea.

The AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) featuring the 5th International Atomic Layer Etching Workshop (ALE 2018) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2018 Workshop (ALE 2018), so that attendees can interact freely. The conference will take place Sunday, July 29-Wednesday, August 1, 2018, at the Songdo Convensia in Incheon, South Korea.
 
Link to Conference page: https://ald2018.avs.org/ 
 
 

TU Eindhoven present LEGO stop motion movie of a novel area-selective ALD approach


Please find the original publication in the Atomic Limits Blog (LINK) as well as the Open Source publication below.

A. Mameli, M. J. M. Merkx, B. Karasulu, F. Roozeboom, W. M. M. Kessels, and A. J. M. Mackus, Area-selective atomic layer deposition of SiO2 using acetylacetone as a chemoselective inhibitor in an ABC-type cycle, ACS Nano 11, 9303 (2017), DOI: 10.1021/acsnano.7b04701

Saturday, October 7, 2017

ALD for coat of minitablets for effective taste masking

Atomic layer deposition—A novel method for the ultrathin coating of minitablets

International Journal of Pharmaceutics, Volume 531, Issue 1, 5 October 2017


(Picture from graphical abstract)


Abstract

We introduce atomic layer deposition (ALD) as a novel method for the ultrathin coating (nanolayering) of minitablets. The effects of ALD coating on the tablet characteristics and taste masking were investigated and compared with the established coating method. Minitablets containing bitter tasting denatonium benzoate were coated by ALD using three different TiO2 nanolayer thicknesses (number of deposition cycles). The established coating of minitablets was performed in a laboratory-scale fluidized-bed apparatus using four concentration levels of aqueous Eudragit® E coating polymer. The coated minitablets were studied with respect to the surface morphology, taste masking capacity, in vitro disintegration anddissolution, mechanical properties, and uniformity of content. The ALD thin coating resulted in minimal increase in the dimensions and weight of minitablets in comparison to original tablet cores. Surprisingly, ALD coating with TiO2 nanolayers decreased the mechanical strength, and accelerated the in vitro disintegration of minitablets. Unlike previous studies, the studied levels of TiO2 nanolayers on tablets were also inadequate for effective taste masking. In summary, ALD permits a simple and rapid method for the ultrathin coating (nanolayering) of minitablets, and provides nanoscale-range TiO2 coatings on porous minitablets. More research, however, is needed to clarify its potential in tablet taste masking applications.

Monday, October 2, 2017

The Korea Research Institute of Chemical Technology develops ALD MoS2 catalyst for hydrogen fuel

The Korea Research Institute of Chemical Technology (KRICT) has developed a core electro-catalyst design technology that can significantly improve electrochemical fuel reaction which produces hydrogen fuel.

The research team led by Dr. Kim Hyung-joo from CO2 energy vector research division at the KRICT announced on September 27 that it succeeded in developing the technology that can activate fuel reaction by changing the surface of molybdenum disulfide (MoS2) which is cheaper than white gold.

Source: BusinessKorea LINK

TSMC selects Nova VeraFlex III XF XPS for critical Logic ALD process monitoring

REHOVOT, Israel: Nova (Nasdaq: NVMI), a leading innovator and a key provider of metrology solutions for advanced process control used in semiconductor manufacturing, announced today that its most advanced XPS platform was selected by the world's leading Foundry for inline applications to be deployed in its advanced technology nodes. Revenue from this order is expected to be recognized during the third quarter of 2017.
The VeraFlex III XF combines enhanced XPS capability with a unique low energy XRF (LE-XRF) channel to address the metrology challenges of 20nm nodes and beyond. The VeraFlex III XF is the third generation of the globally adopted VeraFlex series of XPS production systems. With technology enhancements that improve performance on current inline logic and memory film applications, the VeraFlex III XF provides solutions for emerging applications in FinFET HKMG, interconnect processes, and advanced memories. (http://www.novameasuring.com/veraflex3xf.html)

The VeraFlex III XF is the latest generation of the VF XPS series, which offers superior sensitivity to sub-angstrom thickness and composition characterization used for monitoring critical processes such as atomic layer deposition (ALD) at the most advanced Logic nodes.


Full story : LINK 

NCD signed the large-scale contract to supply ALD equipment to Chinese DMEGC for high efficiency solar cells

NCD has just received the large-scale contract with Chinese DMEGC to supply up to 400MW solar cell manufacturing ALD equipment. This mass production equipment is several Lucida (TM) GS1600 ALD and Automation Systems to produce high efficiency crystalline solar cells with depositing fast high quality Al2O3 ALD on Si wafers. It is repeat order of the same system supplied in the production line in 2016 because the customer has been satisfied with the excellence of the system, that is, NCD’s technology and competitiveness are confirmed by the Chinese customer again. NCD is discussing supply agreements with many other customers besides this contract so is looking forward to rapid sales growth in the near future. 


Lucida TM GS1600 ALD and Automation

Wednesday, September 27, 2017

AIXTRON provides novel deposition system to EPFL for 2D materials research

Leading Swiss university focuses on the development of next-generation semiconductors based on AIXTRON BM system

 
AIXTRON SE (FSE: AIXA), a worldwide leading provider of deposition equipment to the semiconductor industry, today announced that the École Polytechnique Fédérale de Lausanne (EPFL) in Lausanne (Switzerland) has purchased a BM NOVO system. This versatile tool which can produce virtually all variations of 2-dimensional materials (2D) required for emerging optoelectronic applications is dedicated to support the University’s research projects coordinated by Prof. Andras Kis and Prof. Aleksandra Radenovic.

AIXTRON’s BM NOVO system uses a unique combination of plasma-enhanced chemical vapor deposition (PECVD) technology and metal organic chemical vapor deposition (MOCVD) technology to enable the growth of high quality 2D materials such as transition metal dichalcogenides (TMDCs) e.g. molybdenum disulfide (MoS2) or tungsten diselenide (WSe2).

Source: Aixtron LINK

Picosun ships ALD tools to the metal coating industry

ESPOO, Finland, 27th September, 2017 – Picosun Oy, leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating technology, reports of a new breakthrough and repeat sales into metal industries. Picosun’s large scale production ALD systems have been chosen for high volume manufacturing of functional coatings on steel products at various customer locations around the world.

 
The PICOSUN™ P-1000 ALD system is designed for batch coating of various 3D objects such as mechanical parts, glass or metal sheets, coins, jewelry, or medical implants.

Picosun has developed comprehensive ALD solutions for metal surface treatment already for years with its customers and collaboration partners, gaining unrivalled process and design know-how on the topic. With the production-optimized PICOSUN™ ALD equipment, large batches of three-dimensional items can be processed with highly uniform, dense and conformal coating quality down to every microscopic surface detail. Various industries have already selected Picosun’s ALD systems to manufacture e.g. bioactive coatings on metal-based medical implants, and anti-tarnish films to protect coins from discoloration.

Tuesday, September 26, 2017

The 6th ALD Lab Saxony Symposium at the SEMICON Europe 2017 in Munich, Germany

Please be invited to participate in the annual ALD Lab Saxony Symposium at SEMICON Europa on the 14th of November (10:00 to 15:00) in Munich Germany. The event is free of charge for all visitors to SEMICON Europa and we are very thankful for the sponsoring from Picosun Oy (Platiunum). TECHCET LLC (Gold) and Pegasus Chemicals (Silver).



Confirmed Presentations:

ALD Labs:
  • „Fabrication of 3D microstructures from micron-sized powder using ALD and possible applications for MEMS”, Dr. Thomas Lisec, Fraunhofer ISIT (Germany)
  • „Passivation, Capacitors or 3D-Structures – Outline the Possibilities of ALD”, Dr. Dorothee Dietz, Fraunhofer IMS (Germany)
  • „ALD equipment and precursors for high volume manufacturing”, Dr. Jonas Sundqvist, Fraunhofer IKTS (Germany) 
  • „In-situ metrology for ALD“ Dr. Martin Knaut, IHM TU Dresden (Germany)
  • „ALD process optimization using computational fluid dynamics” Linda Jäckel, Fraunhofer ENAS (Germany)
Industry:

  • „ALD for Production“, Dr. Christoph Hossbach, Picosun Oy (Finland)
  • „Electronics: a key market for Umicore - a key partner for the market” Oliver Briel, Umicore (Germany)
  • „Supply chain of critical materials fro the semiconductor industry”, Dr. Diane Scott, TECHCET LLC (USA)
  • „Precursor delivery systems for ALD & CVD”, Daniel Schlamm, SEMPA Systems GmbH (Germany)



Friday, September 22, 2017

High-k oxides by ALD Workshop Wroclaw, Poland, on March 7-10, 2018

In collaboration with the EU COST networking project HerALD, Polish Vacuum Society, Institute of Physics, Polish Academy of Sciences invites you to the next edition of the conference "High-k oxides by ALD", which will be held in Wroclaw, Poland, on March 7-10, 2018. New challenges offered by the application of ALD based high-k dielectric materials in nanotechnology will be discussed by more than 80 participants from industry, research institutes and universities.
 
 
The conference is continuation of NaMLab workshops - a stimulating European platform for application-oriented scientists to exchange ideas and discuss latest experimental results on process technology, new results in the field of ALD-grown dielectrics for solar cells, transparent conduction oxides (TCOs), and for silicon based micro- and nano-electronics. The 2018 edition is organized in Poland to increase integration between Eastern and Western Europe countries.
 
Important dates
In 2018 the Conference will take place in Wrocław on
March 7th - 10th (Wednesday evening to Saturday morning).

Early Regisration & payment deadline:
December 15th 2017

Regisration & Abstract submission deadline:
January 12th 2018

Merck sets up ALD/CVD Precursor R&D center in Taiwan

Merck has inaugurated its first IC materials application R&D center in Asia, which will be located in Kaohsiung, southern Taiwan. More than EUR2.8 million (US$3.35 million) will be invested in the facility. The center will be supporting Merck's local semiconductor customers in Taiwan, and clients in other Asian countries including Korea, Japan and China. The center will consist of two labs supporting the development of:
  • CVD/ALD materials for thin-film processes
  • conductive pastes for IC packaging applications
Merck currently has 660 employees stationed in Taiwan. The company has a global workforce of around 50,000 people.

Source: Digi Times (LINK)

Thursday, September 21, 2017

Intelligent design for smartwatches using ALD display

LUMINEQ reports: Watches are experiencing a retro-heritage boom as the Insta generation has turned its smartphone lens to classic timepieces. Remakes of classic '50s designs are taking advantage of the retro wave, and even haute horlogerie is getting hot with younger consumers moving into the fine timepiece market.

This year we've also seen a shift in the old-school luxury wristwatch world as LVMH and Montblanc joined TAG Heuer in the luxury smartwatch category. There's plenty of room for competition here, as many luxury watch companies have yet to join the smartwatch wagon. One reason for this hesitancy may be due to the perceived notion that you have to compromise on style when incorporating new technology with contemporary designs.


  Wrist watch with retro-design (beneq.com)

With Transparent Lumineq® TASEL® displays, you have the luxury of designing a smartwatch display without compromising on aesthetics.


More infiormation from Beneq/Lumineq:

Custom displays
Lumineq product pages


UC Santa Cruz is building a Huge Astronomical ALD machine

UC Santa Cruz researchers is working with Structured Materials Industries to design and build an atomic layer deposition (ALD) system large enough to accommodate telescope mirrors. To be specific they will deposit a protective optical coating for large silver-based telescope mirrors by ALD.

Left: The summit of Mauna Kea is considered one of the world's most important astronomical viewing sites. The twin Keck telescopes are among the largest optical/near-infrared instruments currently in use around the world. Middle: The night sky and Keck Observatory laser for adaptive optics. Right: W. M. Keck Observatory at sunset (Wikipedia)

UC Santa Cruz Reports: The new system was delivered to Kobayashi's laboratory in July, 2017 and has performed well in initial testing. The researchers will use the system to demonstrate that it works for telescope mirrors and other large substrates and to continue perfecting the coatings. The system can accommodate a mirror up to 0.9 m in diameter, and there is no reason the design could not be scaled up to accommodate larger mirrors or mirror segments, Phillips says. The 10 m primary mirrors of the twin Keck Telescopes in Hawaii are composed of hexagonal segments 1.8 m across, and the mirror segments for the Thirty Meter Telescope (TMT) will be 1.4 m across.


The Astronomical ALD system will be used to deposit protective coatings on silver-based telescope mirrors (Picture from UC Santa Cruz).

Source: UC Santa Cruz (LINK)

Swedish-American glō Orders G5+ MOCVD System for Micro-LED Production

This summer Google announced that it has invested 15 million USD for a 13 percent stake in Glo, a Swedish Lund University spin-out focused on creating nanowire-based LED-displays for mobile phones and smart watches as well as AR- and VR-applications (LINK). 

Now Aixtron Reports: AIXTRON SE (FSE: AIXA), a worldwide leading provider of deposition equipment to the semiconductor industry, announced today that it has received an order for an AIX G5+ platform from Swedish-American company glō-USA, Inc. The group focuses on the commercialization of micro-LED (mLED) products based on their proprietary defect-free GaN nanowires technology. Such 3D structures enable the growth of mLEDs while maintaining the reliability of an inorganic material system. AIXTRON’s AIX G5+ Planetary Reactor® system was selected in the scope of glō’s strategic expansion and will be delivered with an 8x150 mm configuration in the course of Q4/2017.

Thursday, September 14, 2017

ALD Nano today announced Wayne Simmons as CEO

ALD Nano today announced that its Board of Directors has appointed Wayne Simmons as Chief Executive Officer effective September 2017. Dr. Simmons was also elected to the Board of Directors. He will replace Founding CEO, Mike Masterson, who will assume the role of Executive Chairman with an added advisory role for key markets and will continue to serve as Chairman of ALD Nano's Board. The company has also announced that Joe Spencer was elevated to Vice President of Engineering and that its employee base continues to expand with new hires in areas including engineering, science and business development.
“This is the right time for Wayne Simmons to become ALD Nano's next CEO. We've selected a successful leader at a time when ALD Nano’s global leadership in ALD on particles is growing in existing and new markets ,” said ALD Nano Chairman Mike Masterson. “I joined ALD Nano because I wanted to be a part of a company that is solving important challenges for advanced materials that are transforming industries," said Wayne Simmons. “This company has built over a decade of ALD expertise with all of its business and scientific founders still active. Together, additional expertise has been added over the years that creates a wealth of institutional ALD knowledge to deploy into commercial markets."
Full story and Source: ALD Nanosulution Newsletter LINK
About ALD Nano: Principally located in Broomfield CO, ALD NanoSolutions was spun out in 2001 from premier atomic layer deposition (ALD) laboratories at the University of Colorado to industrialize ALD applications. We use our patented Particle ALD TM technology to improve a number of products including battery and lighting materials. Through our efforts, we have engineered new processes and tools that we support and sell from lab to production scale. We are also integrating our Polymer ALD TM technology into an advanced manufacturing system to bring low cost barriers to the packaging industry. Our principle objective is to leverage our expertise to help our customers develop successful commercial products. We are a dynamic and flexible company with a long history of successful relationships with clients ranging from venture-backed startups to Fortune 50 corporations.

Wednesday, September 13, 2017

NCD supplied Full Automation for Lucida GS Series to Tongwei Solar

NCD has recently supplied Full Automation System to Chinese Tongwei Solar for solar cell manufacturing ALD equipment. This is Full Automation System including pitch changer to supply wafers automatically to Lucida GS ALD Series which had already installed in the customer site for high quality Al2O3 thin film deposition. The connection of ALD and Full Automation System to handle wafers automatically will make faster and more convenient ALD process.

In the future, the sales of Full Automation System along with ALD equipment will be increasing because most customers will need more productivity and more efficiency of work. 
Lucida™ GS Series + Automation