Sunday, July 17, 2016

The 3rd International Conference on ALD Applications & 2016 China ALD Conference

Following the successes of the previous two international Conferences on ALD Applications and China ALD Conferences since 2010, the 3rd International Conference on ALD Applications & 2016 China ALD Conference will be a four-day meeting, dedicated to the fundamentals and applications of Atomic Layer Deposition (ALD) technology in various fields. It will be held in Suzhou, China, from October 16 to 19, 2016. This conference will feature plenary sessions, oral sessions, poster sessions and industrial exhibitions.

 
Please submit your abstract for Oral or Poster presentation to the email address: cald@fudan.edu.cn by 31 August 2016. Preregistration opens on 15 July 2016.

For more information, please visit the C-ALD website: http://www.c-ald.com/

Organizing Committee chairs: 
 Prof. Shi-Jin Ding, Fudan University (sjding@fudan.edu.cn
Prof. Yongfeng Mei, Fudan University (yfm@fudan.edu.cn