Friday, February 27, 2015

Catalyst Design with Atomic Layer Deposition

A new ALD review on catalyst design from University of Wisconsin−Madison, Argonne National Laboratory and Northwestern University:

Catalyst Design with Atomic Layer Deposition

Brandon J. O’Neill, David H. K. Jackson, Jechan Lee, Christian Canlas, Peter C. Stair, Christopher L. Marshall, Jeffrey W. Elam, Thomas F. Kuech, James A. Dumesic, and George W. Huber

ACS Catal., 2015, 5, pp 1804–1825
DOI: 10.1021/cs501862h
Publication Date (Web): February 6, 2015

Atomic layer deposition (ALD) has emerged as an interesting tool for the atomically precise design and synthesis of catalytic materials. Herein, we discuss examples in which the atomic precision has been used to elucidate reaction mechanisms and catalyst structure–property relationships by creating materials with a controlled distribution of size, composition, and active site. We highlight ways ALD has been utilized to design catalysts with improved activity, selectivity, and stability under a variety of conditions (e.g., high temperature, gas and liquid phase, and corrosive environments). In addition, due to the flexibility and control of structure and composition, ALD can create myriad catalytic structures (e.g., high surface area oxides, metal nanoparticles, bimetallic nanoparticles, bifunctional catalysts, controlled microenvironments, etc.) that consequently possess applicability for a wide range of chemical reactions (e.g., CO2 conversion, electrocatalysis, photocatalytic and thermal water splitting, methane conversion, ethane and propane dehydrogenation, and biomass conversion). Finally, the outlook for ALD-derived catalytic materials is discussed, with emphasis on the pending challenges as well as areas of significant potential for building scientific insight and achieving practical impacts.

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