Tuesday, February 25, 2014

Journal of Vacuum Science & Technology A Special Issue on Atomic Layer Deposition for AVS ALD 2014

AVS-ALD 2014 in Kyoto har reported that Journal of Vacuum Science & Technology A is soliciting research articles for publication in a Special January/February 2015 Issue on Atomic Layer Deposition.

This special issue is planned in collaboration with the 14th International Conference on Atomic Layer Deposition (ALD 2014) to be held in Kyoto, Japan during June 15-18, 2014. The Special Issue will be dedicated to the science and technology of atomic layer controlled deposition of thin films. While a significant fraction of the articles are expected to be based on material presented at ALD 2014, research articles that are on ALD but were not presented at this conference are also welcome: the special issue will be open to all articles on the science and technology of ALD.

Check te conference program for more information here.
Invited Speakers (Confirmed)

Prof. Jiyoung Kim, Univ. Texas at Dallas, USA, “Ozone Based ALD”
Dr. Scott Clendenning, Intel, USA, “New chemical routes into ALD materials and their applications”
Dr. Toshihide Nabatame, NIMS, Japan, “Characterization of several Higher-k films fabricated by Th- and PE-ALD process”
Prof. Yongfeng Mei, Fudan Univ., China, “Atomic layer deposition as a new tool for interdisciplinary research”